多(duo)晶(jing)(jing)硅(gui)(gui)(gui)(gui)是(shi)用工業硅(gui)(gui)(gui)(gui)通過(guo)化學(xue)、物(wu)理(li)(li)途徑提純制得(de)，多(duo)晶(jing)(jing)硅(gui)(gui)(gui)(gui)主要用于生產單(dan)晶(jing)(jing)硅(gui)(gui)(gui)(gui)和衛星太陽能(neng)電(dian)池。單(dan)晶(jing)(jing)硅(gui)(gui)(gui)(gui)即硅(gui)(gui)(gui)(gui)半導體是(shi)多(duo)晶(jing)(jing)硅(gui)(gui)(gui)(gui)的(de)(de)(de)衍(yan)生產品，是(shi)制造繼承電(dian)路和電(dian)子元件的(de)(de)(de)優質材料，被(bei)廣泛應用于電(dian)子工業中。 還原爐沉(chen)積(ji)多(duo)晶(jing)(jing)硅(gui)(gui)(gui)(gui)是(shi)間歇(xie)操作，一個運(yun)行(xing)周期(qi)內，硅(gui)(gui)(gui)(gui)棒不斷長大，一個運(yun)行(xing)周期(qi)結束(shu)后打開鐘罩(zhao)收割硅(gui)(gui)(gui)(gui)棒。但在(zai)(zai)運(yun)行(xing)期(qi)內，基(ji)盤及鐘罩(zhao)表(biao)面均會產生一層(ceng)土黃色粉末，其主要成分是(shi)無定形硅(gui)(gui)(gui)(gui)。在(zai)(zai)收割硅(gui)(gui)(gui)(gui)棒后，需要進行(xing)基(ji)盤和鐘罩(zhao)的(de)(de)(de)清理(li)(li)，再裝硅(gui)(gui)(gui)(gui)芯(xin)進行(xing)下一個周期(qi)的(de)(de)(de)化學(xue)氣相沉(chen)積(ji)。

還(huan)(huan)原(yuan)(yuan)(yuan)爐(lu)(lu)(lu)(lu)鐘(zhong)罩(zhao)(zhao)(zhao)污(wu)(wu)染(ran)物(wu)易造成(cheng)(cheng)內表(biao)面(mian)熱(re)量(liang)(liang)反射減少，使生(sheng)產(chan)(chan)能耗增(zeng)加(jia)；電(dian)極(ji)周(zhou)圍污(wu)(wu)染(ran)物(wu)降(jiang)低了(le)點擊的(de)絕緣而(er)導致運行(xing)過程中接地故(gu)障、倒棒(bang)等(deng)生(sheng)產(chan)(chan)事故(gu)。而(er)用(yong)(yong)于電(dian)子(zi)行(xing)業的(de)多(duo)(duo)晶(jing)(jing)硅(gui)對產(chan)(chan)品質量(liang)(liang)純凈(jing)度的(de)控制要求(qiu)更高， 隨著我國半(ban)導體(ti)工(gong)業發(fa)展，對多(duo)(duo)晶(jing)(jing)硅(gui)純度要求(qiu)越來越高，還(huan)(huan)原(yuan)(yuan)(yuan)爐(lu)(lu)(lu)(lu)沉積環境的(de)潔凈(jing)度就顯(xian)得(de)特別關鍵，任何顆粒性雜(za)質、油脂(zhi)等(deng)物(wu)質余(yu)留在爐(lu)(lu)(lu)(lu)內，都(dou)會對產(chan)(chan)品質量(liang)(liang)造成(cheng)(cheng)影響。那么(me)，如何清(qing)(qing)(qing)(qing)(qing)(qing)理能方(fang)便(bian)快捷，同(tong)時效果更佳？ 多(duo)(duo)晶(jing)(jing)硅(gui)還(huan)(huan)原(yuan)(yuan)(yuan)爐(lu)(lu)(lu)(lu)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)系統始于2009年，國內*家研(yan)發(fa)設計(ji)制造并(bing)獲得(de)實用(yong)(yong)新型專利是北京德高潔清(qing)(qing)(qing)(qing)(qing)(qing)潔設備有限(xian)公司(si)，該公司(si)多(duo)(duo)晶(jing)(jing)硅(gui)還(huan)(huan)原(yuan)(yuan)(yuan)爐(lu)(lu)(lu)(lu)鐘(zhong)罩(zhao)(zhao)(zhao)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)系統覆(fu)蓋了(le)國內多(duo)(duo)家多(duo)(duo)晶(jing)(jing)硅(gui)生(sheng)產(chan)(chan)企(qi)業。早期有高壓(ya)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)、化學溶劑低壓(ya)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)、機械拋光等(deng)，但大(da)多(duo)(duo)釆用(yong)(yong)堿液(ye)(ye)中壓(ya)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)，這(zhe)些清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)方(fang)式(shi)不(bu)僅不(bu)能將(jiang)鐘(zhong)罩(zhao)(zhao)(zhao)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)干凈(jing)，還(huan)(huan)會損傷(shang)表(biao)面(mian)鍍銀的(de)還(huan)(huan)原(yuan)(yuan)(yuan)爐(lu)(lu)(lu)(lu)鐘(zhong)罩(zhao)(zhao)(zhao)，為攻克這(zhe)一(yi)難題(ti)，一(yi)款全新的(de)用(yong)(yong)于電(dian)子(zi)級(ji)(ji)的(de)多(duo)(duo)晶(jing)(jing)硅(gui)還(huan)(huan)原(yuan)(yuan)(yuan)爐(lu)(lu)(lu)(lu)鐘(zhong)罩(zhao)(zhao)(zhao)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)系統應(ying)運而(er)生(sheng)。 電(dian)子(zi)級(ji)(ji)多(duo)(duo)晶(jing)(jing)硅(gui)還(huan)(huan)原(yuan)(yuan)(yuan)爐(lu)(lu)(lu)(lu)鐘(zhong)罩(zhao)(zhao)(zhao)自動清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)系統特點： 1、多(duo)(duo)晶(jing)(jing)硅(gui)還(huan)(huan)原(yuan)(yuan)(yuan)爐(lu)(lu)(lu)(lu)鐘(zhong)罩(zhao)(zhao)(zhao)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)系統以(yi)水為動力(li)(li)，以(yi)水力(li)(li)自驅動三維(wei)洗(xi)(xi)(xi)(xi)罐器為噴(pen)(pen)頭，形(xing)(xing)成(cheng)(cheng)360° 3D形(xing)(xing)式(shi)的(de)網狀(zhuang)噴(pen)(pen)射來完成(cheng)(cheng)爐(lu)(lu)(lu)(lu)筒(tong)內部(bu)表(biao)面(mian)的(de)水力(li)(li)掃射。 2、采用(yong)(yong)可(ke)以(yi)旋(xuan)轉和(he)升降(jiang)的(de)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)吹干執行(xing)機構，根據還(huan)(huan)原(yuan)(yuan)(yuan)爐(lu)(lu)(lu)(lu)每個(ge)視孔(kong)鏡相對原(yuan)(yuan)(yuan)點的(de)相對位置進(jin)行(xing)準(zhun)確定位。可(ke)自動切換(huan)不(bu)同(tong)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)液(ye)(ye)及(ji)吹干，通過控制系統可(ke)對清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)、吹干時間等(deng)進(jin)行(xing)調整。清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)時只(zhi)需一(yi)鍵操(cao)(cao)作(zuo)即可(ke)，操(cao)(cao)作(zuo)簡單方(fang)便(bian)。 3、根據還(huan)(huan)原(yuan)(yuan)(yuan)爐(lu)(lu)(lu)(lu)底部(bu)法蘭的(de)結構特設計(ji)升級(ji)(ji)后的(de)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)工(gong)作(zuo)臺，不(bu)僅可(ke)以(yi)滿(man)(man)足對內壁和(he)視孔(kong)鏡的(de)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)，同(tong)時也(ye)滿(man)(man)足了(le)底部(bu)法蘭的(de)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)。可(ke)實現對法蘭內邊緣的(de)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)，保證整個(ge)法蘭底部(bu)都(dou)被清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)液(ye)(ye)覆(fu)蓋，并(bing)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)、吹干。 4、在整個(ge)還(huan)(huan)原(yuan)(yuan)(yuan)爐(lu)(lu)(lu)(lu)的(de)清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)過程中，清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)、干燥中筒(tong)內形(xing)(xing)成(cheng)(cheng)微負壓(ya)狀(zhuang)態，防止清(qing)(qing)(qing)(qing)(qing)(qing)洗(xi)(xi)(xi)(xi)外溢，同(tong)時將(jiang)底座與筒(tong)體(ti)下法蘭處(chu)的(de)污(wu)(wu)染(ran)物(wu)等(deng)一(yi)并(bing)吹掃，通過排污(wu)(wu)管排出，從而(er)保證了(le)整個(ge)過程不(bu)會對潔凈(jing)區(qu)造成(cheng)(cheng)污(wu)(wu)染(ran)。

經過實(shi)(shi)際應用，多晶(jing)硅還原爐清(qing)洗系統(tong)整套系統(tong)可實(shi)(shi)現(xian)全(quan)自動(dong)(dong)化清(qing)洗操作(zuo)(zuo)，在(zai)一個工(gong)作(zuo)(zuo)平臺上，一次(ci)吊(diao)裝可依次(ci)實(shi)(shi)現(xian)自動(dong)(dong)清(qing)洗烘(hong)干(gan)全(quan)部功(gong)能，完(wan)(wan)全(quan)實(shi)(shi)現(xian)無死角清(qing)洗，同時具有完(wan)(wan)善(shan)的聯(lian)鎖(suo)和保護功(gong)能。